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政府间气候变化专门委员会(IPCC)第六次评估报告清华大学宣讲会
清美讲坛:乔治·史威兹贝尔的动画艺术世界
第446期“工物学术论坛”: 锦屏低温晶体量热器无中微子双贝塔衰变实验
物理系colloquium: 空间量子物理实验
报告题目:
Degradation of hexagonal silicon carbide-based bipolar devices
 报告人:
Prof. Marek Skowronski
报告时间:
2005-09-15 10:00
报告地点:
清华大学材料院学术报告厅(逸夫技术科学楼2-321室)
主办单位:
清华大学材料科学与工程研究院
  简介:

 

Degradation of hexagonal silicon carbide-based bipolar devicesM. Skowronski Department of Materials Science and Engineering, Carnegie Mellon UniversitySilicon carbide displays multiple characteristics that make it ideally suited for efficient high voltage switching devices.  However, the commercialization of this technology has been hampered by degradation of SiC p-n junctions due to the expansion of Shockley-type stacking faults.  The faults gradually cover most of the junction area and impede current flow. This talk will cover the properties of faults in hexagonal SiC polytypes and their bounding dislocations as well as the mechanism and driving force for fault expansion.  The approaches to materials growth and processing leading to elimination of this effect will be discussed. 

 

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