Abstract

Nanopositioning and Nanomeasuring Machines (NPMM), developed at TU Ilmenau provides high-precision measurement and positioning of objects across 10 decades, from 20 pm resolution up to 200 mm measuring range. They are working on the basis of the error-minimal, extended 6 degrees of freedom Abbe-comparator principle, with high precision fibre coupled laser interferometers and several optical, tactile and atomic force probes.

Step height standards from some nanometres height up to the micrometre range can be measured with a conformity to reference value of the national metrology institute (PTB) in the 1 nm range. Measurements on precision step heights up to 5 mm show a repeatability of 20 pm. Also, pitch measurements of lateral gratings up to 20 pm reproducibility where shown. The high positioning capability was demonstrated in a go round in 25 nm circles with the stage of the NPM-machine with a control deviation of less than 0.5 nm. Control deviations in the order of 3 nm can be achieved with scanning speed of 1 mm/s.

With the new approach of an atomic clock stabilized He -Ne-laser via a high stable frequency comb we achieve a frequency stability of less than 400 Hz (3s), respective 1.2^.10^-12 relative frequency stability within 1 sec. integration time or 2^.10^-13 with 100 sec.integration time.

Ongoing work is focused on direct fiber coupling the high-precision stabilized HeNe laser to the laser interferometers of the NPM machine.

These machines are suitable not only to measure with an outstanding nanometre performance but also to manipulate and to fabricate on the nanoscale. NPMM technology is increasingly proving to be a key technology and enabler for many areas of nanotechnologies, from MEMS fabrication and analysis, up to advanced tip and laser based nanofabrication as a new alternative lithography approach.

Here, our aim is to combine latest micro- and nanofabrication technologies with the enormous possibilities of the NPMM. For example, a fs-laser was integrated into the machine and first micro-structures based on two photon polymerization were realized. Furthermore, a new AFM tip-based nanofabrication process for high-localized sub-5nm structuring is developed and investigated. The publication presents measurement and processing results and discusses the enormous possibilities of this new technology.

Additional Lectures:

Basics of Nanometrology

Part one: laser interferometry up to the picometre range

Part two: stabilization of laser sources and fiber coupling