from    
to    
search  

 


化学工程联合国家重点实验室(清华大学)学术论坛-固体核磁共振波谱分析及其应用
清华-富士康纳米科技前沿论坛(第十三讲): 仿生多尺度孔道研究
清华五道口全球胜任力项目系列讲座——关于未来中日经济的合作
化学工程联合国家重点实验室(清华大学)学术论坛-化工本质安全和硝化本质安全保障技...
报告题目:
Degradation of hexagonal silicon carbide-based bipolar devices
 报告人:
Prof. Marek Skowronski
报告时间:
2005-09-15 10:00
报告地点:
清华大学材料院学术报告厅(逸夫技术科学楼2-321室)
主办单位:
清华大学材料科学与工程研究院
  简介:

 

Degradation of hexagonal silicon carbide-based bipolar devicesM. Skowronski Department of Materials Science and Engineering, Carnegie Mellon UniversitySilicon carbide displays multiple characteristics that make it ideally suited for efficient high voltage switching devices.  However, the commercialization of this technology has been hampered by degradation of SiC p-n junctions due to the expansion of Shockley-type stacking faults.  The faults gradually cover most of the junction area and impede current flow. This talk will cover the properties of faults in hexagonal SiC polytypes and their bounding dislocations as well as the mechanism and driving force for fault expansion.  The approaches to materials growth and processing leading to elimination of this effect will be discussed. 

 

联系人    舒红 62772507

 

 

今日相关信息
 
同类别相关信息
生物降解塑料聚乳酸现况、挑战和展望
先进橡胶纳米复合材料: 从基础到应用-...
Interfaced Heterogeneous Nanodimers
材料院《材料科学论坛》:One-step sp...
药物递送中的高分子原理--清华2015高分...
学术活动