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第478期“工物学术论坛”:X射线探测器领域的行业发展情况和机遇
天文系 Colloquium: Interstellar X-ray Dust Scattering: Current Research andFu...
【图书馆系列讲座】开题与立项前的文献调研概述(理工类)
【图书馆系列讲座】开题与立项前的文献调研概述(社科类)
报告题目:
二次离子质谱在半导体器件失效分析中的应用
 报告人:
姜志雄博士(Dr.Zhixiong Jiang)
美国Freescale公司(前Motorola公司半导体测试部)资深科学家
报告时间:
2011-06-22 14:30
报告地点:
清华大学东主楼十区三楼309会议室
主办单位:
清华大学电子工程系
  简介:


Abstract
Applications of SIMS in failure analyses of semiconductor devices

Zhixiong Jiang

Freescale Semiconductor, Inc., 3501 Ed Bluestein Boulevard, MD: K10, Austin, TX 78721, USA

Analyses aimed to understand the cause of device failures or process drift are common tasks in the semiconductor industry. Among various inspection techniques, SIMS is one of the well established approaches in device/process failure analyses. It is capable of detecting drift in the in-depth distribution of various species as a result of mis-process. SIMS is also a unique technique in examining contamination in failed devices thanks to its great detection sensitivity. A typical failure analysis with SIMS is often directly conducted onto failed devices following dedicate deprocess of the devices or on test wafers specifically prepared to reflect the processes that have caused the device failures. In this presentation, we will talk about some examples of SIMS failure analyses in a variety of device regions with contamination or misprocess during ion implantation, cleaning, thin film growth, etc.


Biography

Dr. Zhixiong Jiang is a senior staff scientist in the SIMS lab of the Physical Analysis Laboratories (TX) of Freescale Semiconductor, Inc (former Semiconductor Product Sector of Motorola Inc.). At this role he has developed numerous SIMS analytical techniques that have been intensively used in process monitoring and device characterization in Freescale Semiconductor. Before he joined Motorola Inc. in 2000, he was a senior research engineer in the Department of Failure Analysis and Reliability, Institute of Microelectronics (IME), Singapore. In IME he performed development and applications of advanced surface analysis techniques of SIMS, Auger and SPM to support R&D and manufacturing of semiconductor industry in Singapore. From 1995 to 1998, Dr. Jiang was a postdoctoral research fellow in the Delft University of Technology, the Netherlands, where he studied fundamentals and applications of low energy SIMS. He earned his Ph.D in 1995 from Tsinghua University in Beijing, under supervision of Prof. Liangzhen Cha. Dr. Jiang has been an active researcher in the area of SIMS and made numerous contributions to the fundamentals and applications of SIMS. He (co-)authored over 60 publications in journals and conference proceedings, holds two US patents, and reviewed papers for a couple of precious journals.


        

 

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