戴高良博士分别在1994年和1999年在清华大学精密仪器与机械学系获得工学学士和工学博士学位，后赴德工作，长期从事精密测量方面研究，在精密测量领域的研究成果经国际比测，处于国际最高水平。目前担任德国联邦物理技术研究所（PTB）光刻掩模版研究室负责人。
SPMs are capable of measuring nanostructures with both a high vertical resolution (far below 1 nm) and a high lateral resolution (defined by the tip, may down to a few nm) directly, (almost) destructively and in 3D. Some milestones in our research will be highlighted. For instance, the Veritekt and the NMM-based large range metrological AFM -- the great fruits of the cooperation between the PTB and TU-Ilmenau -- will be reviewed and their outstanding metrological performance and a number of application examples will be introduced. A 3D/CD-AFM newly developed to meet the stringent measurement precision and accuracy of the advanced lithography techniques will be detailed. The application of transition electron microscopy (TEM) for traceable CD metrology will be presented. The comparison on the CD and SWA metrology of a EUV-photomask between the 3D/CD-AFM and the PTB x-ray scatterometry will be reported. |
