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清华软件论坛第十九期|C.Mohan: Systems Design Dilemmas: Simplicity Versus Comp...
第459期“工物学术论坛”: 基于深硅刻蚀工艺的 X 射线光栅制备方法简介
第458期“工物学术论坛”:“先锋”:下一代π介子衰变实验
Discovery of a New Removable Directing Group for C-H Functionalization
报告题目:
Overcoming the doping bottleneck in wide-gap semiconductors
 报告人:
Su-huai Wei
NREL, Golden
报告时间:
2008-07-10 15:00
报告地点:
物理系三楼报告厅
主办单位:
物理系
  简介:
报告摘要:Application of semiconductors as electric and optoelectronic devices depends critically on their dopability. Failure to dope a material, i.e., to produce enough free charge carriers beyond a certain limit, is often the single most important bottleneck for advancing semiconductor-based high technology. Using the first-principles band structure method, we have studied systematically the general chemical trends of the defect formation and ionization in semiconductors to understand the physical origin of the doping difficulty. New approaches to overcoming the doping limit have been developed.
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