from    
to    
search  

 


机理认知驱动的多环吲哚衍生物可控合成:从基态到激发态
清华2023高分子前沿讲座-有机半导体与碳纳米管电子学
【清华医学·未来医学大讲堂】首讲| Neglected research in deepening the healths...
天文系 Colloquium:The variation of the stellar initial mass function(IMF)wit...
报告题目:
Degradation of hexagonal silicon carbide-based bipolar devices
 报告人:
Prof. Marek Skowronski
报告时间:
2005-09-15 10:00
报告地点:
清华大学材料院学术报告厅(逸夫技术科学楼2-321室)
主办单位:
清华大学材料科学与工程研究院
  简介:

 

Degradation of hexagonal silicon carbide-based bipolar devicesM. Skowronski Department of Materials Science and Engineering, Carnegie Mellon UniversitySilicon carbide displays multiple characteristics that make it ideally suited for efficient high voltage switching devices.  However, the commercialization of this technology has been hampered by degradation of SiC p-n junctions due to the expansion of Shockley-type stacking faults.  The faults gradually cover most of the junction area and impede current flow. This talk will cover the properties of faults in hexagonal SiC polytypes and their bounding dislocations as well as the mechanism and driving force for fault expansion.  The approaches to materials growth and processing leading to elimination of this effect will be discussed. 

 

联系人    舒红 62772507

 

 

今日相关信息
 
同类别相关信息
One-dimensional Nanomaterials: Thei...
Metallopolyynes and Metallophosphor...
Artificial Photosynthesis (Water Sp...
Key Challenges of OLED Manufacturing
材料院《材料科学论坛》:“新材料之王”...
学术活动