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Counting holes in the Fermi sea ---- topological aspects of metals
Symmetries of Kitaev spin-S models and their implications
【低维量子物理国家重点实验室杰出学者讲座】Kagome Metals and Superconductors -...
【低维量子物理国家重点实验室杰出学者讲座】Imaging material strain using advan...
报告题目:
Emerging Micro/Nanopatterning Techniques for MEMS/NEMS
 报告人:
Dr. Juergen Brugger
University of Neuchatel in Physical-Electronics
报告时间:
2008-03-26 15:30
报告地点:
清华大学微电子所(新所)302室
主办单位:
IEEE电子器件学会清华学生分会、清华大学微电子学研究所
  简介:

内容简介:
This talk will first give an overview of emerging nanopatterning methods and will then discuss in more detail two methods that are based on the local deposition of material, i.e. a vacuum-based high-resolution shadow mask process (stencil lithography) and a drop-on-demand dispensing of functional liquids by inkjet printing.

报告人简介:
—Ph.D., University of Neuchatel in Physical-Electronics
—Director of the Microsystems Laboratory at the Faculty of Engineering Science and Technology at the Ecole Polytechnique Federale de Lausanne (EPFL), 2001-now
 —Editorial board member of the IOP journal "Nanotechnology"
—Regular reviewer for international journals in the field of MEMS and nanotechnology (Applied Physics Letters, Nanoletters, Advanced Functional Materials, Rev. Sci. Instr., Microelectronic Engineering, Sensors & Actuators, IEEE-MEMS, amongst others)
—Member of the IEEE-IEDM program committee
—Nominated General Chair for the Eurosensors XXIII, Lausanne, 2009
—European Program Chair of the IEEE-NEMS conference, Shenzhen, China, 2009 
研究兴趣:Interdisciplinary and experimental micro and nanotechnologies towards integrated micro/nanosystems with components at mesoscopic scales.

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