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全球变化科学紫荆论坛第440期:Tropical forest growth and mortality under globa...
清华大学材料科学与工程研究院《材料科学论坛》:弛豫铁电相和普通铁电相之间的“模糊...
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报告题目:
Silicon IC Technology Innovations and Challenges
 报告人:
蒋尚义 博士
台积电(TSMC)资深研发副总裁
报告时间:
2015-08-31 10:00
报告地点:
理科楼三楼报告厅(C302)
主办单位:
量子物质科学协同创新中心&物理系
  简介:
讨论半导体集成电路技术历年来主要的创新和挑战,目前该技术已接近成熟期,接下来可能的机会在哪里,将会提到一些成本和获利的问题。 

个人简介:Dr. Shang-Yi Chiang is Senior Vice President of Research and Development at TSMC. Dr. Chiang joined TSMC in 1997, retired briefly in 2006, and returned in September 2009 to resume his position leading R&D at the company. He obtained his B.S. degree from National Taiwan University in 1968, M.S. from Princeton University in 1970, and Ph.D. from Stanford University in 1974, all in Electrical Engineering. Prior to joining TSMC, he served at Hewlett-Packard Company for 17 years, at Texas Instruments for five years, and at ITT Corporation for one year.



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